The AMAT 0100-71304 CVD Board is a critical component in semiconductor manufacturing equipment, specifically designed for Chemical Vapor Deposition (CVD) processes.
Below are its key functions and technical details:
1. Primary Functions:
Process Control & Monitoring:
Manages precision temperature and gas flow control during CVD processes to ensure uniform film deposition on wafers.
Supports real-time feedback for adjusting parameters like pressure, temperature, and reactant concentrations.
Power Distribution & Safety:
Distributes and monitors electrical power to CVD chambers, heaters, and other subsystems with high reliability.
Includes overcurrent/overvoltage protection to safeguard sensitive semiconductor fabrication steps.
Integration & Compatibility:
Designed for AMAT’s CVD systems (e.g., CENTURA series) and third-party automation platforms.
Features smart control interfaces for remote monitoring and diagnostics.
2. Technical Specifications:
Voltage/Current Monitoring: Supports multi-channel power parameter tracking (e.g., voltage, current, power factor).
Operating Conditions: Stable performance in high-temperature and corrosive gas environments.
3. Applications:
Semiconductor Fabrication: Used in thin-film deposition (e.g., SiO₂, Si₃N₄) for IC manufacturing.
Advanced Materials: Applied in solar cell and MEMS device production.
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